Pt-W 합금, 더 얇은 고NA EUV 마스크 흡수층 가능성 보여 (중국과학원 등)

Home TECHNICAL PAPERS October 25th, 2026 - By: Technical Paper Link Researchers at Chinese Academy of Sciences, Jilin University, State Key Laboratory of Advanced Manufacturing for Optical Systems, and University of Chinese Academy of Sciences published a technical paper titled “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.” “In this study, we investigate an alternative Pt-W alloy as a next-generation low-n EUV mask absorber,” states the paper. Find the technical paper here. August 2026. Li, Zhonghua, Haolong Tang, Xiaoyi Wang, Hongwei Tian, Yanchao Wang, and Hanwen Hu. “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.” iScience, August 2026. https://doi.org/10.1016/j.isci.2026.116912. Attribution-NonCommercial 4.0 International. - Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.) 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