EUV 및 전자빔 노출 시 드라이-디포지티드 레지스트의 다른 톤 행동 (KU 루번, 공주대, VUB, imec)

Home TECHNICAL PAPERS October 25th, 2026 - By: Technical Paper Link Researchers at KU Leuven, Kunsan National University, Vrije Universiteit Brussel, imec, et al. published “Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resists for Electron-Beam and Extreme Ultraviolet Lithography.” Abstract Excerpt: “Dry-deposited metal–organic resists are key enablers for advanced patterning processes in next-generation semiconductor manufacturing. Here, we report halogenated amorphous zeolitic imidazolate framework (a-ZIF) resists deposited entirely by a dry process, which exhibit a pronounced irradiation-source-dependent tone conversion.” Find the technical paper here. October 2026. Byeon, Jinhwan, Nick Gys, Jorid Smets, Ali Azimi, Lukas Nulens, João Fernandes, Leen Boullart et al. “Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resists for Electron-Beam and Extreme Ultraviolet Lithography.” ACS Applied Materials & Interfaces (2026). - Dry-Deposited Resist Shows Different Tone Behavior Under EUV And E-Beam Exposure (KU Leuven, Kunsan, VUB, Imec) October 25, 2026 by Technical Paper Link - Silicon Photonic Modulator Reaches 200 Gb/s PAM4 With Reduced DSP (Science Tokyo, Yokohama, AIST, PETRA) October 25, 2026 by Technical Paper Link - Security-Aware Layer Mapping Reduces Fault Vulnerability In 3D Compute-In-Memory (ASU, U. of Maryland) October 25, 2026 by Technical Paper Link - Neural Networks Speed 3nm Nanosheet SPICE Simulation (TU Munich) October 25, 2026 by Technical Paper Link - Agentic AI Explores Heterogeneous Chip and Interconnect Architectures (Argonne, UIUC) October 19, 2026 by Technical Paper Link How to achieve a 10X productivity improvement using AI agents. by Ed Sperling AI workloads are pushing automotive sensors harder, forcing engineers to rethink how long safety-critical systems can be trusted. 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